COMPACT PREPARATIVE SYSTEMS
A highly effective compact preparative system containing a UV-VIS DAD detector, a preparative gradient pump, an automatic inject valve, and a fraction collector. The detector allows absorbance measuring at four wavelengths at the same time and scanning through the entire spectrum.
| Image | PN | Name | Flow rate [ml/min] | Maximal pressure [MPa/PSI] | UV-VIS detector range [nm] | Sample loop [ml] | Request quote |
|---|---|---|---|---|---|---|---|
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Image
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PN
ECS28P0X
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Name
ECS28 P Compact preparative system 250 ml
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Flow rate [ml/min]
0.5 – 250
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Maximal pressure [MPa/PSI]
30 / 4351 up to 100 ml/min then linearly down up to 15 / 2176 at 250 ml/min
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UV-VIS detector range [nm]
200 - 800
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Sample loop [ml]
10
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Actions
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Image
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PN
ECS58P0X
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Name
ECS58 P Compact preparative system 50 ml
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Flow rate [ml/min]
0.1 – 50
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Maximal pressure [MPa/PSI]
30 / 4351
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UV-VIS detector range [nm]
200 - 800
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Sample loop [ml]
2
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Actions
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|
Image
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PN
ECS08P0X
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Name
ECS08 P Compact semi-preparative system 10 ml
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Flow rate [ml/min]
0.02 - 10.00
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Maximal pressure [MPa/PSI]
40 / 5802
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UV-VIS detector range [nm]
200 - 800
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Sample loop [ml]
2
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Actions
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- Description
- Parameters
- Files to download 6
The system is controlled by a built-in PC and touch screen.
A modular solution allows configuring the unit according to customer needs. This system contains a detector with a wavelength range of 200–800 nm, a pump with a flow rate of up to 250; 50 and 10 ml/min according system type, and a fraction collector.
Main parts
TOY18DAD800L DETECTOR
It is a UV-VIS diode array detector, which allows measuring the absorbance of four wavelengths in a range of 200–800 nm simultaneously in one cell just as scanning of whole spectra. Standardly is assembled with preparative cell PLCC07L, but other cells are available.
ECF2096 FRACTION COLLECTOR
Fractions are collected according to the chosen method, which is simply created using a touch screen. Racks for 8, 21, 40 ml tubes, 60 ml vials, or 12 funnels, 30 mm.
AUTOMATIC INJECT VALVE
The valve is driven by a step motor and it is automatically switched by software. The system also allows manual sample injection by opening a column.
SYSTEM PC INFO
Installed industrial PC with Intel Atom 4 core processor. OS Linux, Touch screen 12,1“ 1024 x 786, SW QUEEN controls gradient, flow rate, wavelengths, fractions collection, etc. Remote administration is available. Possibility of measuring at four wavelengths at the same time and scanning through entire spectra. Furthermore, the possibility of displaying 3D data.
ECP PREPARATIVE GRADIENT PUMP
Modified for the compact system, quaternary gradient pump with flow rate according system type up to 250; 50 or 10 ml/min . Unit software includes a new learning algorithm for pulsation suppression and many testing and diagnostic functions.
| COMPACT PREPARATIVE SYSTEM | |||
| Interface | 3xUSB, 2xLAN, RS232 | ||
| Power supply | 100 - 240 V AC | ||
| Power input | 400 W | ||
| Dimensions W x H x D | 500 x 678 x 482 mm (19.69 x 26.69 x 18.98") | ||
| Weight | 55 kg (121.30 lb) | ||
| Detector | |||
| Wavelength range | 200 - 800 nm (256 elements on CCD) | ||
| Number of channels (Signals) | 4 | ||
| Scan | 200 - 800 nm, up to 20 Hz, step 1 nm | ||
| Typical spectral half-width | 10 nm | ||
| Accuracy of adjustment / Reproducibility | ± 1 nm / ±0.5 nm | ||
| Noise level at test cell (254 nm, TC 0.75s) | ± 5 x 10-5 AU | ||
| Drift at test cell (254 nm after 1 h) | 1 x 10-3 AU/hr | ||
| Materials in contact with the mobile phase | FEP; fused silica, stainless steel, PEEK | ||
| The time constant (T63) | 0.5 s, 0.75 s, 1.0 s, 2.0 s, 4.0 s, 8.0 s, 16.0 s, 0.2 s, 0.1 s | ||
| Fraction collector | |||
| Available racks (four racks per unit) | EC08 48 tubes of 8 ml (OD 12 mm) (384 ml/rack) | ||
| EC21 36 tubes of 21 ml (OD 16 mm) (756 ml/rack) | |||
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EC40 24 tubes of 40 ml (OD 20 mm) (960 ml/rack) |
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| EC60 20 vials of 60 ml (OD 27.5 mm) (1200 ml/rack) | |||
| F12A 12 funnels, 30 mm | |||
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Maximum flow rate for tubes 8 ml |
max. 50 ml/min | ||
| Maximum flow rate for tubes 21, 40 ml | max. 300 ml/min | ||
| Maximum flow rate for vials 60 ml | max. 300 ml/min | ||
| Maximum flow rate for funnels | max. 500 ml/min | ||
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Wetted materials |
FEP, Tefzel®, PPS, KEL-F, PTFE, PEEK, SS 316, glass SIMAX | ||
| Input tubing | OD 1/8“ x ID 1/16“ FEP | ||
| Pump | For ECS28P0X | For ECS58P0X | For ECS08P0X |
| Flow rate | 0.5 – 250 ml/min | 0.1 - 50 ml/min | 0.02 - 10 ml/min |
| Maximum operating pressure | 30 MPa (4351 PSI) up to 100 ml/min then linearly down up to | 30 MPa (4351 PSI) | 40 MPa (5802 PSI) |
| 15 MPa (2176 PSI) at 250 ml/min | |||
| Flow rate setting | 0.1 ml/min steps | 0.1 ml/min steps | 0.01 ml/min steps |
| Repeatability of flow rate adjusting | ± 0,5 % | ± 0,5 % | ± 0.5 % |
| Accuracy of flow rate setting | ± 2 % | ± 2 % | ± 2 % |
| Wetted materials | stainless steel, PEEK, TefzelTM, PE, ceramic, seals | stainless steel, PEEK, TefzelTM, PE, ceramic, seals | stainless steel, PEEK, TefzelTM, PE, ceramic, seals |
| Output capillary outer diameter | 1/8” | 1/16” | 1/16” |
| Input tubing outer diameter | 3/16” | 1/8” | 1/8” |
| Interface | 3xUSB, 2xLAN, RS232 |
|---|---|
| Power supply | 100 - 240 V AC |
| Power input | 490 W |
| Dimensions W x H x D | 500 x 678 x 482 mm (17,72 x 19,69 x 25,59") |
| Weight | 55 kg (121,30 lb) |
| Filename | Type |
|---|---|
| Manual-ECSxx_P-cz | pdf (5,1 MB) |
| Manual-ECSxx_P-en | pdf (4,98 MB) |
| ECS28_P-Quick_startup_guide-en-00.pdf | pdf (369,45 KB) |
| ECS28_P-Pruvodce_rychlym_startem-cz-00.pdf | pdf (370,18 KB) |
| Info-ECSxxP_Compact_Preparative_system-en_08.pdf | pdf (256,95 KB) |
| Info-Piston_Seal_Materials-en-01.pdf | pdf (134,34 KB) |
