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Is a preparative pump with very high pressure up to 15 MPa at flow rate of 500 ml/min and 10 MPa at flow rate of 1000 ml/min. It has two pistons connected in parallel, with diameter of 20 mm. It is suited for preparative liquid chromatography where the high pressure is needed, etc.
There is a possibility to use this pump in a high-pressure gradient mode, where two, three or four units are controlled via PC using RS232.
When working with buffered solvents, it is possible to use pistons back washing.
Pump is supported with software ECOMAC and Clarity.
This pump is equipped with the Pressure Compensation Learning algorithm. Thanks to this smart adaptive process, the pump regulates the rotation speed of the camshaft and measure its impact on pressure pulsation to minimize the output pulsation as much as possible. The algorithm, due to its adaptive capacity, is applicable for many combinations of pump working conditions (solvents, columns, etc.).
|Flow rate||2 – 1000 ml/min|
|Maximum operating pressure||15 MPa (2175.6 PSI)|
|Flow rate setting||1 ml/min steps|
|Repeatability of flow rate adjusting||± 1 %|
|Accuracy of flow rate setting||± 2 %|
|Wetted materials||stainless steel, PEEK, TefzelTM, PE, ceramic, seals|
|Communication||RS232,Ethernet (LAN),USB,Remote digital I/O|
|Power supply||100-240V VAC|
|Power input||500 VA|
|Dimensions W x H x D||276 x 153 x 620 mm (10.87 x 6.14 x 24.40 in)|
|Weight||26 kg (57.32 lb)|
|Output capillary outer diameter||1/8"|
|Pressure Compensation Learning||yes|
|Info-ECP201L_pump-en-00.pdf||pdf (158,02 KB)|